加利福尼亚州米尔皮塔斯，2016年8月16日 /美通社 / - 今天，KLA-Tencor Corporation(NASDAQ: KLAC) introduced three advanced reticle inspection systems that address 10nm and below mask technologies: the Teron™ 640, Teron™ SL655 and Reticle Decision Center (RDC). All three systems are key to enabling both current and next-generation mask designs, so that mask shops and IC fabs can more efficiently identify lithographically significant and severe yield-damaging defects.

Utilizing innovative Dual Imaging technology, the Teron 640 inspection system offers the sensitivity necessary for mask shops to accurately qualify advanced optical masks. The Teron SL655 inspection system introduces new STARlightGold™ technology, helping IC manufacturers assess incoming reticle quality, monitor reticle degradation and detect yield-critical reticle defects. The comprehensive reticle quality measurements produced by the Teron inspectors are supported by RDC, a data analysis and management system that provides a wide array of capabilities that drive automated defect disposition decisions, improve cycle time and reduce the reticle-related patterning errors that can affect yield.

"Today's complex patterning techniques, such as spacer assist quadruple patterning (SAQP), utilize increasingly complex masks, making it crucial to qualify and maintain the reticle state to achieve optimal wafer patterning," stated Yalin Xiong, Ph.D., vice president and general manager of the Reticle Products Division (RAPID) at KLA-Tencor. "Our team has developed state-of-the-art reticle inspection and data analysis technologies that address both current and next-generation mask designs. By tying the rich datasets generated by the Teron 640 and Teron SL655 to RDC's evaluation capabilities, mask shops and IC fabs can more efficiently identify lithographically significant reticle defects, thereby improving mask quality control and obtaining better production patterning."

Teron 640建立在针对面具商店的行业领先的Teron标线检查平台上，通过使用双影像模式的193NM照明（使用基于可打印的赤字性能分配）的结合，通过使用193NM照明来支持对先进的光面膜的检查。此外，Teron 640还包括对先进的模具到数据库检查算法的增强功​​能，以进一步最大化缺陷敏感性以及新的更高吞吐量选项，以减少结果的时间。铸造厂和逻辑制造商已安装了多个Teron 640标线检查系统，用于高性能标线质量控制。

Teron SL655的核心技术，明星light黄金，以传入的质量检查从面具中产生黄金参考，然后使用此参考进行重新认证检查。独特的技术可实现全场标线覆盖范围，并最大程度地利用了各种掩模类型的缺陷（例如雾兹生长或污染）的检测，包括利用高度复杂的光学接近技术的掩模类型。Teron SL655的行业领先的生产吞吐量支持与先进的多造影技术相关的水位数量增加所需的快速周期时间。此外，Teron SL655是EUV兼容的，可以与IC制造商合作就投篮式EUV标线检查要求。Teron SL655系统正在使用IC制造商进行评估，用于在芯片生产过程中用于进入的标线质量控制和标线重新资格。

RDC是一个全面的数据分析和存储平台，可支持蒙版商店和IC晶圆厂的多个KLA-Tencor标线检查和计量平台。RDC提供了几种应用程序，包括自动缺陷分类（ADC），该应用程序与检查站同时运行，以及光刻平面审查（LPR），该应用程序分析了由标线检查员检测到的缺陷的可打印性。这些应用程序可自动化缺陷处置决策，从而改善了周期时间和关键错误的减少。RDC已被多个铸造厂和存储器制造商采用，用于掩盖资格期间的数据管理和分析。

The Teron 640, Teron SL655 and RDC join theLMS IPRO6reticle pattern placement metrology system andK-T Analyzer®高级数据分析系统为高级面具和IC制造商提供全面的标线质量解决方案。Teron 640，Teron SL655和RDC也是KLA-Tencor的5D图案控制解决方案™中的关键组件，该组件可以通过整个Fab和Mask Shop中的过程监视和控制来帮助IC制造商获得更好的模式性能。为了维持前沿面具和IC制造所需的高性能和生产率，T​​eron 640，Teron SL655和RDC由KLA-Tencor's global comprehensive service network。More information can be found on the5D图案控制解决方案网页。

About KLA-Tencor:
KLA-Tencor Corporation（NASDAQ：KLAC）是流程控制和收益管理解决方案的领先提供商，与世界各地客户合作开发最先进的检查和计量技术。这些技术为半导体，LED和其他相关的纳米电子工业提供服务。该公司拥有由行业标准产品组成的投资组合和世界一流的工程师和科学家团队，为其客户创建了高级解决方案已有40年了。beplay官网uedKLA-Tencor总部位于加利福尼亚州米尔皮塔斯，在全球范围内专门提供客户运营和服务中心。可以在//m.lisalozano.com(KLAC-P).

前瞻性语句：
Statements in this press release other than historical facts, such as statements regarding the expected performance of the Teron 640 and Teron SL655 reticle inspection systems and the Reticle Decision Center; the extendibility of the Teron 640 and Teron SL655 reticle inspection systems and Reticle Decision Center to future technology nodes; trends in the semiconductor industry and the anticipated challenges associated with them; expected uses of the Teron 640 and Teron SL655 reticle inspection systems and Reticle Decision Center by KLA-Tencor's customers; and the anticipated cost, operational and other benefits realizable by users of the Teron 640 and Teron SL655 reticle inspection systems and Reticle Decision Center, are forward-looking statements, and are subject to the Safe Harbor provisions created by the Private Securities Litigation Reform Act of 1995. These forward-looking statements are based on current information and expectations, and involve a number of risks and uncertainties. Actual results may differ materially from those projected in such statements due to various factors, including delays in the adoption of new technologies (whether due to cost or performance issues or otherwise), the introduction of competing products by other companies or unanticipated technological challenges or limitations that affect the implementation, performance or use of KLA-Tencor's products.

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来源KLA-Tencor Corporation